{"id":154847,"date":"2026-01-12T17:14:52","date_gmt":"2026-01-12T17:14:52","guid":{"rendered":"https:\/\/www.deberes.net\/tesis\/sin-categoria\/deposicion-de-peliculas-de-silice-amorfa-a-partir-de-vapor-mediante-laser-de-excimero-en-configuracion-paralela\/"},"modified":"2026-01-12T17:14:52","modified_gmt":"2026-01-12T17:14:52","slug":"deposicion-de-peliculas-de-silice-amorfa-a-partir-de-vapor-mediante-laser-de-excimero-en-configuracion-paralela","status":"publish","type":"post","link":"https:\/\/www.deberes.net\/tesis\/ciencias-tecnologicas\/deposicion-de-peliculas-de-silice-amorfa-a-partir-de-vapor-mediante-laser-de-excimero-en-configuracion-paralela\/","title":{"rendered":"Deposicion de peliculas de silice amorfa a partir de vapor mediante laser de excimero en configuracion paralela."},"content":{"rendered":"<h2>Tesis doctoral de <strong>  Gonzalez Fernandez Pio Manuel <\/strong><\/h2>\n<p>Esta tesis trata sobre la deposicion de peliculas delgadas de oxido de silicio sobre silicio cristalino mediante la tecnica lcvd utilizando un laser de excimero en configuracion paralela. Se presenta un estudio exhaustivo de la influencia de los parametros de procedimiento en la velocidad de deposicion y propiedades de las peliculas. Ademas se ha elaborado un modelo descriptivo del proceso de deposicion, se ha realizado un compendio de relaciones empiricas para la determinacion indirecta de las propiedades de las peliculas y, por ultimo, se han estudiado las aplicaciones microelectronicas y metalurgicas de estas peliculas.<\/p>\n<p>&nbsp;<\/p>\n<h3>Datos acad\u00e9micos de la tesis doctoral \u00ab<strong>Deposicion de peliculas de silice amorfa a partir de vapor mediante laser de excimero en configuracion paralela.<\/strong>\u00ab<\/h3>\n<ul>\n<li><strong>T\u00edtulo de la tesis:<\/strong>\u00a0 Deposicion de peliculas de silice amorfa a partir de vapor mediante laser de excimero en configuracion paralela. <\/li>\n<li><strong>Autor:<\/strong>\u00a0  Gonzalez Fernandez Pio Manuel <\/li>\n<li><strong>Universidad:<\/strong>\u00a0 Santiago de compostela<\/li>\n<li><strong>Fecha de lectura de la tesis:<\/strong>\u00a0 01\/01\/1991<\/li>\n<\/ul>\n<p>&nbsp;<\/p>\n<h3>Direcci\u00f3n y tribunal<\/h3>\n<ul>\n<li><strong>Director de la tesis<\/strong>\n<ul>\n<li>mart\u00ednez Y P\u00e9rez P\u00e9rez<\/li>\n<\/ul>\n<\/li>\n<li><strong>Tribunal<\/strong>\n<ul>\n<li>Presidente del tribunal: Miguel Lopez Coronado <\/li>\n<li> Martinez Duart Jos\u00e9 Manuel (vocal)<\/li>\n<li>Juan Piqueras Martinez (vocal)<\/li>\n<li>Gerardo Lopez Araujo (vocal)<\/li>\n<\/ul>\n<\/li>\n<\/ul>\n<p>&nbsp;<\/p>\n","protected":false},"excerpt":{"rendered":"<p>Tesis doctoral de Gonzalez Fernandez Pio Manuel Esta tesis trata sobre la deposicion de peliculas delgadas de oxido de silicio [&hellip;]<\/p>\n","protected":false},"author":1,"featured_media":0,"comment_status":"open","ping_status":"open","sticky":false,"template":"","format":"standard","meta":{"site-sidebar-layout":"default","site-content-layout":"","ast-site-content-layout":"","site-content-style":"default","site-sidebar-style":"default","ast-global-header-display":"","ast-banner-title-visibility":"","ast-main-header-display":"","ast-hfb-above-header-display":"","ast-hfb-below-header-display":"","ast-hfb-mobile-header-display":"","site-post-title":"","ast-breadcrumbs-content":"","ast-featured-img":"","footer-sml-layout":"","theme-transparent-header-meta":"","adv-header-id-meta":"","stick-header-meta":"","header-above-stick-meta":"","header-main-stick-meta":"","header-below-stick-meta":"","astra-migrate-meta-layouts":"default","ast-page-background-enabled":"default","ast-page-background-meta":{"desktop":{"background-color":"var(--ast-global-color-4)","background-image":"","background-repeat":"repeat","background-position":"center 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